For specific applications, end of process can be triggered on the wafer He backside flow. The new software He EPD option allows EPD detection when the wafer is etched through. Detection is made on He flow increase and process ends above a determined flow threshold

        ·          Available for AMS200, AMS110, AMS3200, AMS4200
        ·          Used for specific applications when the wafer is etched through without backside layer
        ·          Over-etch can be optimized after He flow increase detection